Using allyl halides (C3H5X, X = Cl, Br) to generate adsorbed C3H5 fragments
and halogen atoms, we have studied the isomerization and reactivity of sig
ma -bonded (eta (1)) and pi -bonded (eta (3)) C3H5 on two metal substrates,
Cu(100) and Ag(111), using vibrational and thermal desorption spectroscopi
es. On Cu(100), two forms of eta (3)- C3H5, denoted endo-eta (3)-C3H5 <----
> exo-eta (3)-C3H5, are identified that undergo a reversible temperature-de
pendent isomerization. When dissociative adsorption of C3H5X saturates on C
u(100), only eso-eta (3)-C3H5 is found between 77 and 300 K. On Ag(111), et
a (1)-C3H5 and eta3-C3H5 (both exo and endo) form at 110 K, depending on th
e dose. The eta (1)-C3H5 and exo-eta (3)-C3H5 irreversibly isomerize to end
o-eta (3)-C3H5 upon annealing to 175 K. When either metal substrate, held a
t a selected temperature between 77 and 150 K, is dosed with C3H5Br, there
is a reaction with eta (3)-C3H5 to form 1,5-hexadiene, C6H10 This reaction
does not occur upon dosing with C3H5Cl. When eta (3)-C3H5 is heated above 2
00 K, different results obtain for the two metals: on Cu(100), in agreement
with previous work, C3H5 radical desorption at 450 K dominates, while dime
rization and desorption as C6H10 at similar to 250 K occurs on Ag(111).