High temperature oxidation of silicon hexaboride ceramics

Citation
J. Matsushita et S. Komarneni, High temperature oxidation of silicon hexaboride ceramics, MATER RES B, 36(5-6), 2001, pp. 1083-1089
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS RESEARCH BULLETIN
ISSN journal
00255408 → ACNP
Volume
36
Issue
5-6
Year of publication
2001
Pages
1083 - 1089
Database
ISI
SICI code
0025-5408(200103/04)36:5-6<1083:HTOOSH>2.0.ZU;2-A
Abstract
Isothermal oxidation of silicon hexaboride (SiB6) ceramic powder at high te mperature was investigated. The SiB6 powder samples were heated from room t emperature to 1273K for 25 hours in air, and weight changes were measured t o estimate the oxidation resistance and nature of the oxide layers on the S iB6 ceramics. The samples oxidized In the temperature range of 673 to 1273 K for 25 hours exhibited increasing weight gain with increasing oxidation t emperature. The oxidation proceeded in accordance with the parabolic law du ring the initial oxidation stage. The weight gain increased with increasing oxidation temperature. Based on the results of,X-ray diffraction analysis, silicon oxide (SiO2) and boron oxide (B2O3) were present on the surface of samples oxidized in the temperature range of 873 to 1273 K. (C) 2001 Elsev ier Science Ltd. All rights reserved.