n-type doping with Si and p-type doping with Mg are reported for cubic GaN
grown by molecular beam epitaxy (MBE) on cubic SiC(001). Mg incorporation a
s high as I x 10(19) cm(-3) has been reached at low growth temperatures. Ho
wever, no correlation is found between the hole concentration and Mg concen
tration, probably due to deep levels induced by the stacking faults and the
residual doping present in the layer, as revealed by the deep optical tran
sition which dominates the photoluminescence (PL) spectra. In contrast, n-t
ype doped samples with Si are much better controlled, with a maximum value
of 5 x 10(19) cm(-3) for the free electron concentration, and with a clear
donor signature in their PL spectra. (C) 2001 Elsevier Science B.V. All rig
hts reserved.