Deep levels introduced in n-GaN grown by the ELOG technique by high-energyelectron irradiation

Citation
Sa. Goodman et al., Deep levels introduced in n-GaN grown by the ELOG technique by high-energyelectron irradiation, MAT SCI E B, 82(1-3), 2001, pp. 95-97
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
82
Issue
1-3
Year of publication
2001
Pages
95 - 97
Database
ISI
SICI code
0921-5107(20010522)82:1-3<95:DLIING>2.0.ZU;2-I
Abstract
We have used deep level transient spectroscopy (DLTS) to investigate the el ectron trap defects introduced in n-GaN grown, using the epitaxial lateral overgrowth technique during high-energy electron irradiation from a Sr-90 r adionuclide source. The results indicate that, apart from the major defect with an energy level at 0.20 eV below the conduction band (supposed to be r elated to the V,), at least four other defects with energy levels centered about 0.90 +/- 0.15 eV, are introduced. From modeling, ignoring temperature dependent capture cross-section effects we have determined their activatio n energies, and temperature independent capture cross sections, commonly kn own as the DLTS signature. (C) 2001 Elsevier Science B.V. All rights reserv ed.