Photoluminescence study of GaN grown by pulsed laser deposition in nitrogen atmosphere

Citation
Kw. Mah et al., Photoluminescence study of GaN grown by pulsed laser deposition in nitrogen atmosphere, MAT SCI E B, 82(1-3), 2001, pp. 128-130
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
82
Issue
1-3
Year of publication
2001
Pages
128 - 130
Database
ISI
SICI code
0921-5107(20010522)82:1-3<128:PSOGGB>2.0.ZU;2-6
Abstract
Low temperature photoluminescence measurements were performed on thin films of gallium nitride grown by pulsed laser deposition in a nitrogen atmosphe re. Activation energies of 26.5 and 230 meV were derived from temperature d ependent PL studies of the donor-acceptor (D-A) transitions. Furthermore, f or the 3.41 eV line, two values of activation energy (13.5 and 25 meV) were observed at low and high temperatures. X-ray diffraction showed predominan tly the wurtzite structure, with some evidence for cubic inclusions. We dis cuss these data in terms of the possibility of a mixed phase structure and examine evidence for the localization of the electrons and holes in the two phases. (C) 2001 Elsevier Science B.V. All rights reserved.