A brief review is given of recent progress in fabrication of high voltage G
aN and AlGaN rectifiers, GaN/AlGaN heterojunction bipolar transistors and G
aN metal-oxide semiconductor field effect transistors. Improvements in epit
axial layer quality and in fabrication techniques have led to significant a
dvances in device performance. (C) 2001 Elsevier Science B.V. All rights re
served.