GaN-based high-power laser diodes

Citation
T. Miyajima et al., GaN-based high-power laser diodes, MAT SCI E B, 82(1-3), 2001, pp. 248-252
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
82
Issue
1-3
Year of publication
2001
Pages
248 - 252
Database
ISI
SICI code
0921-5107(20010522)82:1-3<248:GHLD>2.0.ZU;2-S
Abstract
We report our recent progress on GaN-based laser diodes (LDs) which will be applied as a light source in high-density optical storage systems. Recentl y we achieved a lifetime of more than 500 hours under continuous-wave opera tion with a constant power 20 mW at 25 degreesC using GaN-based LDs with a standard ridge structure. We also report the potential of GaN-based LDs wit h another structure of a buried-ridge. The far-field pattern of the LDs wit h a buried-ridge structure strongly depended on the Al content of the AlxGa 1-xN burying layer. This dependency showed that the device characteristics change from gain-guiding to refractive index-guiding. The critical point wa s around x = 0.30 of an Al content which corresponds to Deltan = 0.007 of a lateral index step. It was, therefore, found that the optical transverse m ode can be controlled by adjusting the Al content of the AlxGa1-xN burying layer. (C) 2001 Elsevier Science B.V. All rights reserved.