Improvement of diodes performance with a multiple-pair buffer layer by MOCVD

Citation
Cc. Yang et al., Improvement of diodes performance with a multiple-pair buffer layer by MOCVD, MAT SCI E B, 82(1-3), 2001, pp. 253-255
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
82
Issue
1-3
Year of publication
2001
Pages
253 - 255
Database
ISI
SICI code
0921-5107(20010522)82:1-3<253:IODPWA>2.0.ZU;2-S
Abstract
The GaN home-junction light-emitting diodes (LEDs) with a multiple-pair buf fer layer (MBL) were grown by metalorganic vapor phase epitaxy on sapphire substrates. Each pair of the buffer layer consists of a 300 Angstrom thick GaN nucleation layer grown at a low temperature of 525 degreesC and a 4 m t hick GaN epitaxial layer grown at a high temperature of 1025 degreesC. It i s found that the GaN LEDs with a three-pair buffer layer will exhibit a low turn-on voltage, stronger electroluminescence intensity and higher light-o utput power as compared to the conventional growth without a buffer layer. This is attributed to the effective reduction in the propagation of defects and dislocations near the p-n junction for the LEDs with MBL. (C) 2001 Els evier Science B.V. All rights reserved.