Entangled-state lithography: Tailoring any pattern with a single state

Authors
Bjork, G Sanchez-Soto, LL Soderholm, J
Citation
G. Bjork et al., Entangled-state lithography: Tailoring any pattern with a single state, PHYS REV L, 86(20), 2001, pp. 4516-4519
Citations number
13
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
86
Issue
20
Year of publication
2001
Pages
4516 - 4519
Database
ISI
SICI code
0031-9007(20010514)86:20<4516:ELTAPW>2.0.ZU;2-8
Abstract
We demonstrate a systematic approach to Heisenberg-Limited lithographic ima ge formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel patt ern on a (N + 1) X (N + 1) grid, occupying a square with the side half a wa velength long, can be generated from a 2N-photon state.