Kinetic physical etching for versatile novel design of well ordered self-affine nanogrooves

Citation
S. Van Dijken et al., Kinetic physical etching for versatile novel design of well ordered self-affine nanogrooves, PHYS REV L, 86(20), 2001, pp. 4608-4611
Citations number
33
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
86
Issue
20
Year of publication
2001
Pages
4608 - 4611
Database
ISI
SICI code
0031-9007(20010514)86:20<4608:KPEFVN>2.0.ZU;2-B
Abstract
Ion bombardment at extreme grazing incidence leads to the formation of rema rkably well ordered, one to two atomic layer deep, parallel grooves on a cu (001) surface. These self-organized grooves are oriented parallel to the io n's plane of incidence and their period can be controlled between similar t o4 and 15 nm. We have identified two distinct temperature regimes: Between about 200 and 300 K the substrate temperature controls the period, while be low 200 to about 150 K the ion energy does. The groove separation distribut ion shows distinct self-affine character. The physical origin of the novel nanostructures is discussed.