Comment on "Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si" - Reply

Authors
Krug, C da Rosa, EBO de Almeida, RMC Morais, J Baumvol, IJR Salgado, TDM Stedile, FC
Citation
C. Krug et al., Comment on "Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si" - Reply, PHYS REV L, 86(20), 2001, pp. 4714-4714
Citations number
5
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
86
Issue
20
Year of publication
2001
Pages
4714 - 4714
Database
ISI
SICI code
0031-9007(20010514)86:20<4714:CO"TAC>2.0.ZU;2-B