A new throwing power cell is described in detail; it has the virtue of bein
g usable as a small fixture that can be positioned in an electroplating tan
k, This so-called Assaf Cell is particularly useful for simulating small re
cesses, typically through-holes found in printed circuit boards (PCBs).
This paper demonstrates how a Throwing Power Index, given by the ratio of m
etal thickness on the front and rear faces of the Assaf-Cell test panel, ma
y be used to evaluate/optimize electrodeposition conditions. Data are prese
nted from work using various electrolytes, including high-throw acid copper
solutions, thereby illustrating its usefulness and application.