Adsorption of hydrogen on tantalum in the temperature range 77-373 K

Authors
Bratchikova, IG Mikhalenko, II Sapata, OL Yagodovskii, VD
Citation
Ig. Bratchikova et al., Adsorption of hydrogen on tantalum in the temperature range 77-373 K, RUSS J PH C, 75(5), 2001, pp. 818-822
Citations number
13
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY
ISSN journal
00360244 → ACNP
Volume
75
Issue
5
Year of publication
2001
Pages
818 - 822
Database
ISI
SICI code
0036-0244(200105)75:5<818:AOHOTI>2.0.ZU;2-Z
Abstract
Isotherms of H-2 adsorption on a Ta foil were measured over the temperature range 77-373 K at pressures of 0.06-2.0 Pa. Induced- and activated-adsorpt ion modes were revealed. The adsorption isotherms exhibited a maximum near 300 K. Experimental results were treated using a model adsorption isotherm for surfaces with induced nonuniformity. The shape of the isotherms was des cribed by changes in the character of interaction between the adsorbate and the surface electron density of the metal.