Vacuum are deposition of Ti, TiN and TiO2 decorative coatings on glass

In a vacuum are discharge, highly ionised species are formed, which permits an effective control of the deposition process and, particularly, to depos it Ti, TiN and TiO2 coatings on non-conducting materials like glass. Moreov er this technique allows us to position a mask between the substrates and t he sheets to be coated. Another advantage of the vacuum are technology is t he low substrate temperature during the deposition. Data on the roughness, composition and corrosion resistance in architectural glass mask-coated wit h titanium nitride and oxide are presented and analysed in this work. A com parative analysis is made with reactive direct current sputtering and plasm a enhanced chemical vapour deposition techniques.