Fabrication of Ti/TiO2/MOx electrodes using photoelectrodeposition technique

Authors
Matsumoto, Y Noguchi, M Matsunaga, T Kamada, K Koinuma, M Yamada, S
Citation
Y. Matsumoto et al., Fabrication of Ti/TiO2/MOx electrodes using photoelectrodeposition technique, ELECTROCH, 69(5), 2001, pp. 314-318
Citations number
29
Categorie Soggetti
Physical Chemistry/Chemical Physics","Chemical Engineering
Journal title
ELECTROCHEMISTRY
ISSN journal
13443542 → ACNP
Volume
69
Issue
5
Year of publication
2001
Pages
314 - 318
Database
ISI
SICI code
1344-3542(200105)69:5<314:FOTEUP>2.0.ZU;2-J
Abstract
Photoelectrochemical deposition of metallic oxide (PbO2, RuOx, NiOOH, and C oOOH) onto a Ti substrate was studied and the electrochemical behavior of t he prepared Ti/TiO2/MOx electrodes was examined. The photoelectrochemical d eposition of MOx occurred in the solutions containing Mn+ ions on the Ti su bstrate under anodic bias. Electron holes produced on the TiO2 film surface under illumination may contribute the MOx formation. The prepared Ti/TiO2 /MOx electrodes showed a tunneling current under anodic bias.