IR laser-induced thermolysis and UV laser-induced photolysis of 1,3-diethyldisiloxane: chemical vapour deposition of nanotextured hydridoalkylsilicones

Authors
Urbanova, M Bastl, Z Subrt, J Pola, J
Citation
M. Urbanova et al., IR laser-induced thermolysis and UV laser-induced photolysis of 1,3-diethyldisiloxane: chemical vapour deposition of nanotextured hydridoalkylsilicones, J MAT CHEM, 11(6), 2001, pp. 1557-1562
Citations number
38
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS CHEMISTRY
ISSN journal
09599428 → ACNP
Volume
11
Issue
6
Year of publication
2001
Pages
1557 - 1562
Database
ISI
SICI code
0959-9428(2001)11:6<1557:ILTAUL>2.0.ZU;2-O
Abstract
IR laser thermolysis and UV laser photolysis of gaseous 1,3-diethyldisiloxa ne proceed via different mechanisms: the former involves 1,1-H-2 and ethene elimination, whereas the latter is dominated by 1,1-H-2 and ethane elimina tion. The difference plays an important role in determining the composition of the solid nanotextured films deposited from the gas phase.