Temperature dependence of resistance in reactively sputtered RuO2 thin films

Authors
Tong, KY Jelenkovic, V Cheung, WY Wong, SP
Citation
Ky. Tong et al., Temperature dependence of resistance in reactively sputtered RuO2 thin films, J MAT SCI L, 20(8), 2001, pp. 699-700
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
20
Issue
8
Year of publication
2001
Pages
699 - 700
Database
ISI
SICI code
0261-8028(2001)20:8<699:TDORIR>2.0.ZU;2-C