Accurate metrology improves thin-film filter yield

Authors
Novak, M Zecchino, M Novak, E
Citation
M. Novak et al., Accurate metrology improves thin-film filter yield, LASER FOC W, 2001, pp. 49
Categorie Soggetti
Optics & Acoustics
Journal title
LASER FOCUS WORLD
ISSN journal
10438092 → ACNP
Year of publication
2001
Supplement
S
Database
ISI
SICI code
1043-8092(200105):<49:AMITFY>2.0.ZU;2-H
Abstract
Manufacturers of thin-film filters can ensure quality and yield by examinin g performance factors throughout production. Automated metrology technologi es enable accurate, repeatable, and integrated inspections to provide full- process control and continuous improvement.