Structural and vibrational properties of carbon impurities in crystalline silicon

Citation
Xy. Zhu et al., Structural and vibrational properties of carbon impurities in crystalline silicon, SEMIC SCI T, 16(5), 2001, pp. R41-R49
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
16
Issue
5
Year of publication
2001
Pages
R41 - R49
Database
ISI
SICI code
0268-1242(200105)16:5<R41:SAVPOC>2.0.ZU;2-8
Abstract
Si1-xCx alloys have been studied using self-consistent-charge density-funct ional-based right-binding calculations. The origin of experimentally observ ed carbon-induced vibrational peaks near 475, 607 and 810 cm(-1) are analys ed, based on the theoretical calculations. The stability, vibrational frequ encies, lattice relaxations. and energy gap variances of substitutional, in terstitial single-carbon and dicarbon complexes in crystalline silicon are calculated. All the impurities induce severe lattice relaxations of adjacen t Si atoms. The peak near 475 cm(-1) originates from the lattice relaxation s of Si atoms up to second-nearest neighbours from carbon impurities in all cases. The peak near 605 cm(-1) originates mainly from the midbond interst itial carbon (which is at odds with general belief) whereas the high-energy peaks near 810 cm(-1) result from the formation of the carbon complexes.