Direct patterning ITO transparent conductive coatings

Citation
Q. Wei et al., Direct patterning ITO transparent conductive coatings, SOL EN MAT, 68(3-4), 2001, pp. 383-390
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
SOLAR ENERGY MATERIALS AND SOLAR CELLS
ISSN journal
09270248 → ACNP
Volume
68
Issue
3-4
Year of publication
2001
Pages
383 - 390
Database
ISI
SICI code
0927-0248(200106)68:3-4<383:DPITCC>2.0.ZU;2-2
Abstract
A low cost sol-gel process to directly prepare patterned ITO thin films has been developed by Chemat Technology, Inc. This technique eliminates the ph otolithography process. ITO polymeric precursors were prepared by modificat ion of indium isopropoxide and tin isopropoxide followed by hydrolysis and polycondensation. The polymers were applied onto glass substrates either by dip coating or by spin coating. The ITO polymer films were then patterned by covering with a photomask, exposed to UV irradiation, and developed in a n organic solvent. After sintering in air and annealing in an inert atmosph ere, the patterned ITO films have a sheet resistance of < 25 Omega/square a nd a transmittance of > 90%. The ITO coatings were also found to have very good chemical and mechanical properties. (C) 2001 Elsevier Science B.V. All rights reserved.