Imprinted electrically conductive polyaniline blends

Imprinting electrically conductive patterns directly into Polymethylmethacr ylate/Polyaniline-camphor sulfonic acid (PMMA/PANI-CSA) blends is investiga ted. The amount of PANI-CSA is 10 - 40 wt% in the blend and the correspondi ng conductivity 0.07 - 10 S/cm. M-cresol is used as a solvent. The electric ally conductive films are spin-coated on glass substrates followed by impri nting with a silicon stamp. Reactive ion etching (RIE) is used to separate imprinted lines from each other. The anisotropy larger than 104 in resistan ce perpendicular and parallel to the imprinted ridges is achieved. Etching rate is 260 nm/min for PMMA and increases by a factor of 3 for PANI-CSA. Th e conductivity does not change essentially at elevated temperature in the i mprint process or due to RIE.