Patterned modification of polymer surfaces employing UV sensitive gases

Photochemical methods were developed to obtain polymer surfaces modified wi th specific functional groups. Various polymers (among them polystyrene, po lyethylene and poly(tetrafluoroethylene)) were UV irradiated in the presenc e of reactant gases (BrCN, N2H4 and SO2+ O-2) to introduce nitrile, amino a nd sulfonic acid groups onto the surface. Derivatization reactions allowed the transformation of these groups to carboxylic acids, amides, thioureas a nd derivatives of sulfonic acids (sulfochlorides and sulfonamides). UV proj ection techniques allowed a patterned modification of the surface. The modi fied patterns are of interest for the binding of monomers/oligomers, dyes a nd metallizations.