Study of heterojunction diodes using POMA/PANI and amorphous/microcrystalline silicon structures

Citation
Eat. Dirani et al., Study of heterojunction diodes using POMA/PANI and amorphous/microcrystalline silicon structures, SYNTH METAL, 121(1-3), 2001, pp. 1545-1546
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SYNTHETIC METALS
ISSN journal
03796779 → ACNP
Volume
121
Issue
1-3
Year of publication
2001
Pages
1545 - 1546
Database
ISI
SICI code
0379-6779(20010315)121:1-3<1545:SOHDUP>2.0.ZU;2-Z
Abstract
Photovoltaic diode based on a heterojunction structure combine on amorphous and microcrystalline silicon, deposited by PECVD process, with polyaniline - (PANI) and poly(o-methoxyaniline)-(POMA), using PIN structures. We report IxV characteristic curves of glass/ITO/a-Si:H(p)/POMA or PANI/muc-Si:H(n)/ Al structures. Preliminary results show a dependence of the IxV curves on t he polymer doping level. This structure shows an insulating behavior for un doping or very low doping, photovoltaic effect at medium doping and a typic al resistance curve at high doping level. The device is a promising tool to understand transport and electronic properties of the polymers.