Sputtered yttrium oxide thin films appropriate for electrochemical sensors

Citation
R. Ivanic et al., Sputtered yttrium oxide thin films appropriate for electrochemical sensors, VACUUM, 61(2-4), 2001, pp. 229-234
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
VACUUM
ISSN journal
0042207X → ACNP
Volume
61
Issue
2-4
Year of publication
2001
Pages
229 - 234
Database
ISI
SICI code
0042-207X(20010514)61:2-4<229:SYOTFA>2.0.ZU;2-7
Abstract
This work deals with Y2O3 thin films prepared by r.f. diode sputtering for application in electrochemical sensors. The influence of annealing on selec ted electrical and mechanical properties of Y2O3 thin films has been studie d. With increasing annealing temperature the values of electrical strength and electrical resistivity increase, whereas, the values of relative permit tivity and Young's modulus decrease. Yttrium oxide films have a polycrystal line structure without cubic structural change caused by annealing. The cha nge from compressive to tensile stresses takes place in Y2O3 films with inc reasing temperature. The properties of Y-2 O-3 thin films are comparable wi th the published data. The Y2O3 film was used as an insulation layer in ver tically arranged electrodes in a microelectrochemical cell. The redox recyc ling phenomenon was demonstrated with the redox couple [Fe(CN)(6)](3-/4-). (C) 2001 Elsevier Science Ltd. All rights reserved.