We demonstrate 100-nm-resolution holographic aerial image monitoring based
on lensless Fourier-transform holography at extreme-UV (EUV) wavelengths, u
sing synchrotron-based illumination. This method can be used to monitor the
coherent imaging performance of EW lithographic optical systems. The syste
m has been implemented in the EUV phase-shifting point-diffraction interfer
ometer recently developed at Lawrence Berkeley National Laboratory. Here we
introduce the idea of the holographic aerial image-recording technique and
present imaging performance characterization results for a 10 x Schwarzsch
ild objective, a prototype EW lithographic optic. The results are compared
with simulations, and good agreement is obtained. Various object patterns,
including phase-shift-enhanced patterns, have been studied. Finally, the ap
plication of the holographic aerial image-recording technique to EUV multil
ayer mask-blank defect characterization is discussed. (C) 2001 Optical Soci
ety of America.