Multiple-reflection effects in photoelastic stress analysis

Authors
Citation
Ak. Bhowmik, Multiple-reflection effects in photoelastic stress analysis, APPL OPTICS, 40(16), 2001, pp. 2687-2691
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
40
Issue
16
Year of publication
2001
Pages
2687 - 2691
Database
ISI
SICI code
0003-6935(20010601)40:16<2687:MEIPSA>2.0.ZU;2-V
Abstract
The interpretation of fringes observed in photoelastic stress measurements made with coherent well-collimated optical radiation such as a laser beam a nd slab specimens with parallel surfaces is affected by multiple internal r eflections of Light within the sample, which are usually negligible when in coherent Light is used. An analysis of the multiple-reflection effects in p hotoelastic measurements involving the plane polariscope configuration is p resented. The results show that the isochromatic fringes are modified by th e interference of multiply reflected waves. The multipass differential phas e accumulations that display oscillatory magnitudes as functions of the mod el thickness and the optical wavelength result in a shifted and altered int ensity profile across the isochromatic fringes. It is shown that for large values of reflectivity, as in the case of samples with reflective coating o r partial mirrors, the bright fringes split into multiple peaks. (C) 2001 O ptical Society of America.