Over 1.5 mu m light emission from InAs quantum dots embedded in InGaAs strain-reducing layer grown by metalorganic chemical vapor deposition

Citation
J. Tatebayashi et al., Over 1.5 mu m light emission from InAs quantum dots embedded in InGaAs strain-reducing layer grown by metalorganic chemical vapor deposition, APPL PHYS L, 78(22), 2001, pp. 3469-3471
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
22
Year of publication
2001
Pages
3469 - 3471
Database
ISI
SICI code
0003-6951(20010528)78:22<3469:O1MMLE>2.0.ZU;2-6
Abstract
We demonstrated the 1.52 mum light emission at room temperature from self-a ssembled InAs quantum dots embedded in the In0.45Ga0.55As strain-reducing l ayer. By capping InAs quantum dots with an InGaAs strain-reducing layer ins tead of GaAs, the photoluminescence peak of InAs quantum dots can be contro lled by changing the indium composition of the InGaAs strain-reducing layer . The full width at half maximum is as narrow as 22 meV. The wavelength of 1.52 mum is the longest wavelength so far achieved in self-assembled InAs q uantum dots, which would be promising to quantum-dot lasers on GaAs substra te for application to light sources in long-wavelength optical communicatio n systems. (C) 2001 American Institute of Physics.