New estimates of the piezoelectric charge density at (0001) AlGaN/GaN
interfaces are provided. Undoped HFET structures grown by both MBE and
MOCVD, on sapphire and SiC substrates, exhibit electron densities of
similar to 5 x 10(13) cm(-2).x(Al) (where x(Al) is thr aluminium mol f
raction in the AlGaN), which can be attributed to piezoelectric effect
s. These have a significant influence on the design and behaviour of I
II-V nitride HFETS.