CHEMICAL-REACTION PATH FOR THIN-FILM OXIDATION OF STAINLESS-STEEL

Authors
SHIBAGAKI S KOGA A SHIRAKAWA Y ONISHI H YOKOKAWA H TANAKA J
Citation
S. Shibagaki et al., CHEMICAL-REACTION PATH FOR THIN-FILM OXIDATION OF STAINLESS-STEEL, Thin solid films, 303(1-2), 1997, pp. 101-106
Citations number
11
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
303
Issue
1-2
Year of publication
1997
Pages
101 - 106
Database
ISI
SICI code
0040-6090(1997)303:1-2<101:CPFTOO>2.0.ZU;2-Y
Abstract
An oxide thin film formed on a stainless steel is analyzed by microfoc used Auger electron spectroscopy (mu AES): the oxide film consists of five sublayers of 2 to 4 nm in thickness. A chemical reaction path of this system is elucidated by comparing a chemical potential diagram wi th the elementary distribution observed; thereby the phases in the thi n film are specified. The diffusion property of this system is discuss ed in relation to the chemical reaction path and it is indicated that an up-hill diffusion occurs in the oxide thin film. (C) 1997 Elsevier Science S.A.