SURFACE STUDIES OF CHEMICALLY VAPOR-DEPOSITED SILICON FILMS USING FRICTION FORCE MICROSCOPY

Authors
FLUERARU C COBIANU C COSMIN P DASCALU D
Citation
C. Flueraru et al., SURFACE STUDIES OF CHEMICALLY VAPOR-DEPOSITED SILICON FILMS USING FRICTION FORCE MICROSCOPY, Thin solid films, 303(1-2), 1997, pp. 117-121
Citations number
19
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
303
Issue
1-2
Year of publication
1997
Pages
117 - 121
Database
ISI
SICI code
0040-6090(1997)303:1-2<117:SSOCVS>2.0.ZU;2-N
Abstract
The average friction coefficient as a new parameter for surface charac terization is presented. The measurement conditions for roughness were analysed and the importance of the applied force was proven. The quan titative measurements of friction force versus applied force are prese nted. We found that the average friction force linearly increased with applied force and was reversible with load. The connection between th e average friction coefficient and the roughness surface was experimen tally demonstrated. (C) 1997 Elsevier Science S.A.