THIN REACTIVE LIF FILMS FOR NUCLEAR SENSORS

Citation
F. Cosset et al., THIN REACTIVE LIF FILMS FOR NUCLEAR SENSORS, Thin solid films, 303(1-2), 1997, pp. 191-195
Citations number
7
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
303
Issue
1-2
Year of publication
1997
Pages
191 - 195
Database
ISI
SICI code
0040-6090(1997)303:1-2<191:TRLFFN>2.0.ZU;2-W
Abstract
Lithium fluoride (LiF) films are deposited by thermal evaporation on s ilicon substrates, The substrate temperature and deposition rate's inf luence on the morphology and structure of the films are investigated, It is shown that it is necessary to work with a low deposition rate to have crack-free layers. Also, the substrate temperature has a great i nfluence on coating morphology: the grain size increases with temperat ure. At the same time, the crystallization state increases up to 300 d egrees C. For higher temperatures, recrystallization seems to appear. The grain size increases as well as the grain boundary size. (C) 1997 Elsevier Science S.A.