Lithium fluoride (LiF) films are deposited by thermal evaporation on s
ilicon substrates, The substrate temperature and deposition rate's inf
luence on the morphology and structure of the films are investigated,
It is shown that it is necessary to work with a low deposition rate to
have crack-free layers. Also, the substrate temperature has a great i
nfluence on coating morphology: the grain size increases with temperat
ure. At the same time, the crystallization state increases up to 300 d
egrees C. For higher temperatures, recrystallization seems to appear.
The grain size increases as well as the grain boundary size. (C) 1997
Elsevier Science S.A.