This letter presents recent improvements and experimental results provided
by a GaInAs/InP composite channel high electron mobility transistors (HEMT)
, The devices exhibit good dc and rf performances. The 0.15-mum gate length
devices have saturation current density of 750 mA/mm at V-GS = +0 V The Sc
hottky characteristic is a typical reverse gate-to-drain breakdown voltage
of -8 V. Gate current issued from impact ionization have been studied in th
ese devices, in the first time, versus drain extension, At 60 GHz, an outpu
t power of 385 mW/mm have been obtained in such a device with a 5.3 dB line
ar gain and 41% drain efficiency which constitutes the state-of-the-art.
These results studied are the first reported for a composite channel Al(0.6
5)In(0.35)AS/Ga(0.47)In(0.35)AS/lnP HEMT on InP substrate.