Real-time feedback control of electron density in inductively coupled plasmas

Citation
Ch. Chang et al., Real-time feedback control of electron density in inductively coupled plasmas, J VAC SCI A, 19(3), 2001, pp. 750-756
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
3
Year of publication
2001
Pages
750 - 756
Database
ISI
SICI code
0734-2101(200105/06)19:3<750:RFCOED>2.0.ZU;2-N
Abstract
The real-time feedback control of electron density was performed in an indu ctively coupled plasma (ICP). A 36 GHz heterodyne interferometer was adopte d as the sensor for electron density measurement. The actuator was rf power which drove the ICP antenna. The results show that the electron density in an ICP system is a type 0 system. Therefore, a proportional-integral contr oller is necessary to eliminate steady-state error. A prefilter was designe d to smooth the desired step change of electron density so that the variati on of rf power became mild. A feedforward compensator was added to reduce t he disturbance effect resulting from pressure change. The experimental resu lts showed that the control system could quickly track the desired electron density and compensate the electron density variation resulting from press ure disturbance. (C) 2001 American Vacuum Society.