Resistively heated molecular beam doser for water deposition in ultrahigh vacuum

Authors
Huffstetler, RD Leavitt, AJ
Citation
Rd. Huffstetler et Aj. Leavitt, Resistively heated molecular beam doser for water deposition in ultrahigh vacuum, J VAC SCI A, 19(3), 2001, pp. 1030-1031
Citations number
2
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
3
Year of publication
2001
Pages
1030 - 1031
Database
ISI
SICI code
0734-2101(200105/06)19:3<1030:RHMBDF>2.0.ZU;2-D