Cj. Barrelet et al., Surface characterization and electrochemical properties of alkyl, fluorinated alkyl, and alkoxy monolayers on silicon, LANGMUIR, 17(11), 2001, pp. 3460-3465
Alkyl and fluorinated alkyl monolayers covalently bonded to the silicon (11
1) surface have been prepared by UV illumination of the H-Si(111) surface w
hile immersed in a solution of olefin precursor under high vacuum. An alkox
y monolayer covalently bonded to the silicon (111) surface is formed by the
reaction of the H-Si(111) surface with a heated solution of primary alcoho
l precursors under high vacuum. Ellipsometry, X-ray photoelectron spectrosc
opy, and atomic force microscopy are used to characterize the three monolay
ers. The alkyl monolayer is measured to have the largest number of organic
adsorbates per surface silicon atom. Properties of the monolayers on the si
licon surface are probed by cyclic voltammetry. The hydrophobic alkyl monol
ayer slows the oxidation of the silicon surface by water. The three monolay
ers also slow the rate of electron transfer across the silicon-electrolyte
interface by acting as a tunneling barrier. The alkyl monolayer in tetrahyd
rofuran exhibits a large and reproducible blocking of the electron transfer
.