AFM, SEM, EDX and HRTEM study of the crystalline growth rate anisotropy-induced internal stress and surface roughness of YBaCuO thin film

Citation
F. Pailloux et al., AFM, SEM, EDX and HRTEM study of the crystalline growth rate anisotropy-induced internal stress and surface roughness of YBaCuO thin film, MATER CHAR, 46(1), 2001, pp. 55-63
Citations number
21
Categorie Soggetti
Material Science & Engineering
Journal title
MATERIALS CHARACTERIZATION
ISSN journal
10445803 → ACNP
Volume
46
Issue
1
Year of publication
2001
Pages
55 - 63
Database
ISI
SICI code
1044-5803(200101)46:1<55:ASEAHS>2.0.ZU;2-A
Abstract
The influence of the anisotropy of the crystalline growth rate on the micro structure and morphology of YBaCuO thin film deposited by laser ablation ha s been studied by means of scanning electron microscopy (SEM) and transmiss ion electron microscopy (TEM), atomic force microscopy (AFM) and energy dis persive X-ray (EDX) analysis. The results obtained from high resolution lat tice imaging and large angle convergent beam electron diffraction (LACBED), together with the investigations of the thin film surface morphology. show the strong influence of the different crystalline growth rates on both the internal stress present in the YBaCuO film and the roughness of the outer surface. These results should be of prime importance for the superconductin g properties. This is essential in tailoring these thin films for device ap plications. (C) 2001 Elsevier Science Inc. All rights reserved.