T. Tohma et al., Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis, MATER TRANS, 42(4), 2001, pp. 702-706
BaTiO3 films were, prepared on fused silica substrates by metal-organic che
mical vapor deposition (MOCVD). Effect of deposition conditions on the comp
osition, structure and morphology were studied. Thermodynamic calculations
well predicted the relationship between deposition conditions and the phase
s of deposits. BaTrO3 films in a single phase were obtained at 973 K and Ba
/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO3 films
increased with decreasing total pressure. BaTiO3 film in thickness of abou
t 1 mum had a relative dielectric constant of 480. The dielectric constant
of the BaTiO3 film showed the maximum value of 530 at 360 K.