Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis

Citation
T. Tohma et al., Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis, MATER TRANS, 42(4), 2001, pp. 702-706
Citations number
23
Categorie Soggetti
Material Science & Engineering
Journal title
MATERIALS TRANSACTIONS
ISSN journal
13459678 → ACNP
Volume
42
Issue
4
Year of publication
2001
Pages
702 - 706
Database
ISI
SICI code
1345-9678(200104)42:4<702:POBTFB>2.0.ZU;2-K
Abstract
BaTiO3 films were, prepared on fused silica substrates by metal-organic che mical vapor deposition (MOCVD). Effect of deposition conditions on the comp osition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phase s of deposits. BaTrO3 films in a single phase were obtained at 973 K and Ba /Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO3 films increased with decreasing total pressure. BaTiO3 film in thickness of abou t 1 mum had a relative dielectric constant of 480. The dielectric constant of the BaTiO3 film showed the maximum value of 530 at 360 K.