M. Jergel et al., Study of the fluorine content in precursor and Tl-based thin films by resonant nuclear reaction method, PHYSICA C, 354(1-4), 2001, pp. 353-357
We prepared thin Tl-based films from Ba-Ca-Cu(O,F) precursors containing va
rious amount of fluorine. The precursor films, 150 200 nm thick, were depos
ited on MgO substrates by sequential thermal evaporation of BaF2, Cu and Ca
F2 components. Before thallination, some of these precursors underwent a va
rious degree of an ex-situ vacuum annealing with the aim to remove fluorine
from the films. The fluorine content of three types of precursor films (as
-deposited, partially annealed, fully annealed) was investigated by the res
onant nuclear reaction method.
Precursors were then thallinated and the amount of fluorine in superconduct
ing films was measured again. Besides, films were characterized by resistan
ce vs. temperature measurements and by X-ray diffraction (Bragg-Brentano an
d grazing incidence geometry) as well as by Rutherford back-scattering spec
trometry (chemical composition). Results of these investigations are report
ed. (C) 2001 Elsevier Science B.V. All rights reserved.