A model for surface-relief formation in azobenzene polymers

A novel approach for the theoretical description of surface-relief formatio n will be presented. The model is based upon statistical reorientation of s ide chains in the polymer by repeated trans-cia-trans isomerisation process es. It allows the explanation of surface-relief formation in different type s of polymers. Furthermore the surface-relief formation in single-beam expe riments as well as in intensity and in-phase grating experiments can be cal culated. The described model does not need detailed assumptions on the micr oscopic mechanism which deforms the polymer sample.