Citation
Xj. Wang et al., XRD and Raman study of vanadium oxide thin films deposited on fused silicasubstrates by RF magnetron sputtering, APPL SURF S, 177(1-2), 2001, pp. 8-14
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332
→ ACNP
Volume
177
Issue
1-2
Year of publication
2001
Pages
8 - 14
Database
ISI
SICI code
0169-4332(20010601)177:1-2<8:XARSOV>2.0.ZU;2-8
Abstract
Highly oriented VO2(B), V6O13 and V2O5 thin films have been deposited on fu
sed silica substrates by RF magnetron sputtering. X-ray diffraction charact
erization revealed that all the three films were single phases and strongly
oriented with the (0 0 1) planes parallel to the substrates, The micro-Ram
an scattering spectra of the films were reported. The results were compared
to the micro-Raman scattering spectra of the film obtained by annealing th
e as-deposited VO2(B) film, it was found that the surface of the annealed f
ilm consisted of three regions of the black V6O13 region, the yellow VO2(B)
region and the white non-crystalline region, (C) 2001 Published by Elsevie
r Science B.V.