A method for determination of doping concentration profiles of GaAs multila
yer structures on a bevelled surface by Raman spectroscopy is presented. By
scanning the laser beam along the bevel we obtained micro-Raman spectra in
different depth positions in the structure. Calculated I-TO/I-LO intensiti
es determine the doping concentration in these points for values above 3 x
10(16) cm(-3). The results are compared with electrochemical capacitance-vo
ltage technique and secondary ion mass spectrometry, Some specific problems
are discussed. (C) 2001 Elsevier Science B.V. All rights reserved.