Growth of organic films on passivated semiconductor surfaces: gallium arsenide versus silicon

Citation
Tu. Kampen et al., Growth of organic films on passivated semiconductor surfaces: gallium arsenide versus silicon, APPL SURF S, 175, 2001, pp. 326-331
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
175
Year of publication
2001
Pages
326 - 331
Database
ISI
SICI code
0169-4332(20010515)175:<326:GOOFOP>2.0.ZU;2-2
Abstract
We have investigated the growth of perylene-3,4,9,10-tetracarboxylic-dianhy dride (PTCDA) on hydrogen-passivated Si(1 0 0) and sulfur-passivated GaAs(1 0 0) using in situ Raman spectroscopy. The Raman spectra provide informati on on the internal vibrational modes of the organic molecules as well as on external vibrational modes, or, in other words, phonons. PTCDA films grown on both types of substrates show vibrational modes which correspond to the phonon modes of PTCDA single crystals. The presence of phonon modes in the Raman spectra provides evidence of their crystalline structure. Their inte nsity, full width at half maximum (FWHM), and polarization dependence can b e employed to determine the appropriate substrate for the growth of PTCDA f ilms with high structural quality. The experimental results show that PTCDA films grown on sulfur-passivated G aAs(1 0 0) at 410 K substrate temperature are still polycrystalline but sho w the best structural properties. The FWHM of the phonon modes measured on these films are decreased for substrate temperatures of 350 and 410 K. Phon on as well as internal vibrational modes show a dependence on the polarizat ion geometry, which has so far only been observed in PTCDA crystals up to n ow, (C) 2001 Elsevier Science B.V. All rights reserved.