Doping effects on optical properties of epitaxial ZnO layers determined byspectroscopic ellipsometry

Citation
K. Postava et al., Doping effects on optical properties of epitaxial ZnO layers determined byspectroscopic ellipsometry, APPL SURF S, 175, 2001, pp. 543-548
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
175
Year of publication
2001
Pages
543 - 548
Database
ISI
SICI code
0169-4332(20010515)175:<543:DEOOPO>2.0.ZU;2-5
Abstract
Optical properties of Al- and Ga-doped ZnO layers have been studied in the spectral range from 1.5 to 5.4 eV using a four zone null spectroscopic elli psometer and in the spectral range from 0.5 to 6.5 eV using near-normal inc idence reflectivity measurements. The layers were prepared by RF magnetron sputtering onto (1120) oriented single-crystal sapphire substrates. Al- and Ga-doping gives rise to a shift of the fundamental absorption edge from 3. 4 to 3.7 eV. The model dielectric function (MDF) based on an excitonic stru cture derived by Tanguy [Phys. Rev. B 60 (1999) 10660] was completed by the Sellmeier and I)rude terms. The Drude term describes a free-electron contr ibution originating from presence of the dopant. Spectroscopic ellipsometry and reflectometry are very sensitive to a surface roughness. The surface r oughness was modeled by a surface layer of the Bruggeman effective medium a nd by diffraction theory. (C) 2001 Elsevier Science B.V. All rights reserve d.