Pentacene-based organic field effect transistors (FETs) exhibit enormous po
tential as active elements in a number of applications. One significant obs
tacle to commercial application remains: no completely lithographic process
exists for forming high-performance devices. Processing constraints preven
t electrodes from being lithographically patterned once the semiconductor i
s deposited, but depositing the electrodes before the semiconductor leads t
o low-performance transistors. By using self-assembled monolayers (SAMs) to
change the surface energy of the metal electrodes and morphology of the pe
ntacene subsequently grown on the electrodes, high-performance transistors
may be formed using a process compatible with lithographic definition of th
e source and drain electrodes.