Spatially modified layer properties related to the formation of gallium droplets on GaN(0001) surfaces during plasma-assisted molecular-beam epitaxy

Citation
C. Kruse et al., Spatially modified layer properties related to the formation of gallium droplets on GaN(0001) surfaces during plasma-assisted molecular-beam epitaxy, APPL PHYS L, 78(24), 2001, pp. 3827-3829
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
24
Year of publication
2001
Pages
3827 - 3829
Database
ISI
SICI code
0003-6951(20010611)78:24<3827:SMLPRT>2.0.ZU;2-E
Abstract
The surface morphology and the spatial distribution of defect-related lumin escence of GaN(0001) layers grown by plasma-assisted molecular-beam epitaxy under gallium-rich conditions has been investigated. Droplets of liquid ga llium form on the surface during growth and lead to distinct spiral hillock s under the droplet. The droplets are surrounded by extended voids which po int to an incomplete gallium adlayer on the GaN surface during growth at th e droplet boundary. Cathodoluminescence spectra indicate an enhanced intens ity in the yellow spectral range for the GaN under the droplets which is at tributed to a change in the local density of point defects in the layer. (C ) 2001 American Institute of Physics.