Simulation of I-V characteristics of organic thin film transistor: Application to the dihexylquaterthiophene

Citation
R. Bourguiga et al., Simulation of I-V characteristics of organic thin film transistor: Application to the dihexylquaterthiophene, EPJ-APPL PH, 14(2), 2001, pp. 121-125
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
ISSN journal
12860042 → ACNP
Volume
14
Issue
2
Year of publication
2001
Pages
121 - 125
Database
ISI
SICI code
1286-0042(200105)14:2<121:SOICOO>2.0.ZU;2-R
Abstract
Metal-Insulator-Semiconductor Field-Effect-Transistors based on Dihexyl- qu aterthiophene (DH4T), has been realized. Unlike conventional MISFET, these devices work through the modulation of an accumulation layer at the semicon ductor-insulator interface. An analytical model that describes the operatio n of organic thin-film-transistors based on a simple trap distribution, wit h a single shallow trap level located between the valence-band edge and the Fermi level, has been used to determine some microscopic parameters such a s the mobility, the density of traps and the corresponding level of traps.