J. Lesueur et al., PROPERTIES OF THIN AND ULTRA-THIN YBCO FILMS GROWN BY A COEVAPORATIONTECHNIQUE, Journal of alloys and compounds, 251(1-2), 1997, pp. 156-160
An original system has been set up to grow epitaxially high quality YB
CO thin films in a very reproducible way. This in-situ quasi-MBE techn
ique allows us to prepare films whose cationic composition is kept clo
se to 1:2:3 within 2%, and which therefore display very good crystallo
graphic properties together with a very Bat surface, Moreover, shadow
masks are used to grow up to 4 films of different thicknesses in a sin
gle run and to make in-sim contact pads and caps. As a result, we rout
inely obtain YBCO c-axis films with a Tc(R=0) over 89.5 K (for 50 nm t
hick films on SrTiO3 and MgO) and a resistivity at RT in the 250 mu Om
ega cm range. The reproducibility is excellent, and the spread in resi
stivities for 2 films in a single run is less than 2%, Ultra-thin film
s (5 nm to 50 nm thick) whose electrical properties can hence be close
ly studied have been grown successfully in a single run.