PROPERTIES OF THIN AND ULTRA-THIN YBCO FILMS GROWN BY A COEVAPORATIONTECHNIQUE

Citation
J. Lesueur et al., PROPERTIES OF THIN AND ULTRA-THIN YBCO FILMS GROWN BY A COEVAPORATIONTECHNIQUE, Journal of alloys and compounds, 251(1-2), 1997, pp. 156-160
Citations number
15
Categorie Soggetti
Chemistry Physical","Metallurgy & Metallurigical Engineering","Material Science
ISSN journal
09258388
Volume
251
Issue
1-2
Year of publication
1997
Pages
156 - 160
Database
ISI
SICI code
0925-8388(1997)251:1-2<156:POTAUY>2.0.ZU;2-V
Abstract
An original system has been set up to grow epitaxially high quality YB CO thin films in a very reproducible way. This in-situ quasi-MBE techn ique allows us to prepare films whose cationic composition is kept clo se to 1:2:3 within 2%, and which therefore display very good crystallo graphic properties together with a very Bat surface, Moreover, shadow masks are used to grow up to 4 films of different thicknesses in a sin gle run and to make in-sim contact pads and caps. As a result, we rout inely obtain YBCO c-axis films with a Tc(R=0) over 89.5 K (for 50 nm t hick films on SrTiO3 and MgO) and a resistivity at RT in the 250 mu Om ega cm range. The reproducibility is excellent, and the spread in resi stivities for 2 films in a single run is less than 2%, Ultra-thin film s (5 nm to 50 nm thick) whose electrical properties can hence be close ly studied have been grown successfully in a single run.