PRECURSORS FOR CHEMICAL-VAPOR-DEPOSITION OF YTTRIUM BARIUM COPPER-OXIDE

Authors
OTWAY DJ OBI B REES WS
Citation
Dj. Otway et al., PRECURSORS FOR CHEMICAL-VAPOR-DEPOSITION OF YTTRIUM BARIUM COPPER-OXIDE, Journal of alloys and compounds, 251(1-2), 1997, pp. 254-263
Citations number
22
Categorie Soggetti
Chemistry Physical","Metallurgy & Metallurigical Engineering","Material Science
Journal title
Journal of alloys and compounds → ACNP
ISSN journal
09258388
Volume
251
Issue
1-2
Year of publication
1997
Pages
254 - 263
Database
ISI
SICI code
0925-8388(1997)251:1-2<254:PFCOYB>2.0.ZU;2-P
Abstract
There exists a need for reproducible large area, high quality, thin fi lms of YBa2Cu3O7-delta for insertion into magnetic resonance imaging a nd cellular base station applications. One approach to the fabrication of these films, chemical vapor deposition, currently has some limitat ions placed upon it by the available range of precursor compounds. Thi s report discusses the present commercial options, with an emphasis on the effort demanded to qualify a specific compound for utilization in a manufacturing environment.