High-density packaging and interconnection applications frequently involve
the use of polyimide-based materials as interlevel dielectrics for multilev
el interconnection schemes. Surface planarity after each polymer layer is v
ery important to the fabrication of multilayer structures. Highly nonplanar
surfaces were observed in a multilayer test structure, fabricated using a
thermally cured polyimide (Ultradel 7501), In this study, the effect of a n
ovel cure technique involving electron beam (e-beam) exposure on multilayer
ing and planarization behavior in Ultradel 7501 is investigated. Planarizat
ion measurements were conducted on different feature sizes and at various l
ocations on the wafer in order to investigate the effect of solvent exposur
e, time and area of contact between multiple layers. The degree of planariz
ation was found to improve from -206% for a thermally cured case to +15% fo
r an e-beam cured sample, Analysis of the solvent induced polymer swelling
and its effect on multilayer planarization of Ultradel 7501 is presented.