Topographic cross talk in reflection mode near-field optical microscopy onpatterned structures

In scanning near-field optical microscopy the sample topography may have a strong effect on the optical image signal. This cross talk has been investi gated in subwavelength-periodically patterned thin-film structures using a reflection-mode near-field optical microscope. A comparison between measure d and simulated line scans shows that far-field light waves emitted from th e tip aperture play a major role in the imaging process. (C) 2001 American Institute of Physics.